In-line monitoring of HF-last cleaning of implanted and non-implanted silicon surfaces by non-contact surface charge measurements

dc.contributor.author	Kondoh, Eiichi
dc.contributor.author	Trauwaert, Marie-Astrid
dc.contributor.author	Heyns, Marc
dc.contributor.author	Maex, Karen
dc.date.accessioned	2021-09-30T12:23:17Z
dc.date.available	2021-09-30T12:23:17Z
dc.date.issued	1998
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/2678
dc.source	IIOimport
dc.title	In-line monitoring of HF-last cleaning of implanted and non-implanted silicon surfaces by non-contact surface charge measurements
dc.type	Proceedings paper
dc.contributor.imecauthor	Heyns, Marc
dc.contributor.imecauthor	Maex, Karen
dc.date.embargo	9999-12-31
dc.source.peerreview	no
dc.source.beginpage	221
dc.source.endpage	228
dc.source.conference	Proceedings of the 5th International Symposium on Cleaning Technology in Semiconductor Device Manufacturing
dc.source.conferencedate	31/08/1997
dc.source.conferencelocation	Paris France
imec.availability	Published - open access
imec.internalnotes	Electrochemical Society Proceedings; Vol. 97-35