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Impact of dissolved oxygen in dilute HF solution on material etch

dc.contributor.authorKesters, Els
dc.contributor.authorIwasaki, Akihisa
dc.contributor.authorLe, Quoc Toan
dc.contributor.authorHolsteyns, Frank
dc.date.accessioned2021-10-23T11:43:35Z
dc.date.available2021-10-23T11:43:35Z
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/26818
dc.sourceIIOimport
dc.titleImpact of dissolved oxygen in dilute HF solution on material etch
dc.typeProceedings paper
dc.contributor.imecauthorKesters, Els
dc.contributor.imecauthorLe, Quoc Toan
dc.contributor.imecauthorHolsteyns, Frank
dc.contributor.orcidimecLe, Quoc Toan::0000-0002-0206-6279
dc.source.peerreviewyes
dc.source.beginpage251
dc.source.endpage254
dc.source.conferenceUltra Clean Processing of Semiconductor Surfaces XIII - UCPSS
dc.source.conferencedate11/09/2016
dc.source.conferencelocationKnokke-Heist Belgium
dc.identifier.urlhttp://www.scientific.net/SSP.255.251
imec.availabilityPublished - imec
imec.internalnotesSolid State Phenomena; Vol. 255


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