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Atomic resolution quality control for Fin oxide recess by atomic resolution profiler

dc.contributor.authorKim, Tae-Gon
dc.contributor.authorRyu, Heon-Yul
dc.contributor.authorKenis, Karine
dc.contributor.authorJo, Ah-jin
dc.contributor.authorCho, Sang-Joon
dc.contributor.authorPark, Sang-il
dc.contributor.authorSchmidt, Sebastian
dc.contributor.authorIrmer, Bernd
dc.date.accessioned2021-10-23T11:48:38Z
dc.date.available2021-10-23T11:48:38Z
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/26833
dc.sourceIIOimport
dc.titleAtomic resolution quality control for Fin oxide recess by atomic resolution profiler
dc.typeProceedings paper
dc.contributor.imecauthorRyu, Heon-Yul
dc.contributor.imecauthorKenis, Karine
dc.source.peerreviewyes
dc.source.beginpage304
dc.source.endpage308
dc.source.conferenceUltra Clean Processing of Semiconductor Surfaces XIII - UCPSS
dc.source.conferencedate11/09/2016
dc.source.conferencelocationKnokke Heist Belgium
dc.identifier.urlhttp://zh.scientific.net/SSP.255.304
imec.availabilityPublished - imec
imec.internalnotesSolid State Phenomena; Vol. 255


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