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Plasma induced damage mitigation in spin-on self-assembly based ultra low-k dielectrics using template residues

dc.contributor.authorKrishtab, Mikhail
dc.contributor.authorde Marneffe, Jean-Francois
dc.contributor.authorDe Gendt, Stefan
dc.date.accessioned2021-10-23T11:54:25Z
dc.date.available2021-10-23T11:54:25Z
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/26850
dc.sourceIIOimport
dc.titlePlasma induced damage mitigation in spin-on self-assembly based ultra low-k dielectrics using template residues
dc.typeMeeting abstract
dc.contributor.imecauthorKrishtab, Mikhail
dc.contributor.imecauthorde Marneffe, Jean-Francois
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.conferencePlasma Etch and Strip in Microtechnology - PESM
dc.source.conferencedate9/05/2016
dc.source.conferencelocationGrenoble France
dc.identifier.urlhttp://pesm2016.insight-outside.fr/index.php?langue=en&onglet=11&acces=&idUser=&emailUser=&messageConfirmation=
imec.availabilityPublished - open access


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