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Impact of PVD barrier deposition sequence on ultra low-k dielectrics

dc.contributor.authorKrishtab, Mikhail
dc.contributor.authorWitters, Thomas
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorBaklanov, Mikhaïl
dc.date.accessioned2021-10-23T11:54:43Z
dc.date.available2021-10-23T11:54:43Z
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/26851
dc.sourceIIOimport
dc.titleImpact of PVD barrier deposition sequence on ultra low-k dielectrics
dc.typeMeeting abstract
dc.contributor.imecauthorKrishtab, Mikhail
dc.contributor.imecauthorWitters, Thomas
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage113
dc.source.endpage114
dc.source.conferenceMaterials for Advanced Metallization Conference - MAM
dc.source.conferencedate20/03/2016
dc.source.conferencelocationBrussels Belgium
imec.availabilityPublished - open access
imec.internalnotespaper PD-02


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