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Characterization of patterned porous low-k dielectrics: surface sealing and residue removal by wet processing/cleaning

dc.contributor.authorLe, Quoc Toan
dc.contributor.authorKesters, Els
dc.contributor.authorDecoster, Stefan
dc.contributor.authorChan, BT
dc.contributor.authorNguyen, Mai Phuong
dc.contributor.authorConard, Thierry
dc.contributor.authorVanleenhove, Anja
dc.contributor.authorHolsteyns, Frank
dc.contributor.authorDe Gendt, Stefan
dc.date.accessioned2021-10-23T12:03:57Z
dc.date.available2021-10-23T12:03:57Z
dc.date.issued2016
dc.identifier.issn2162-8769
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/26880
dc.sourceIIOimport
dc.titleCharacterization of patterned porous low-k dielectrics: surface sealing and residue removal by wet processing/cleaning
dc.typeJournal article
dc.contributor.imecauthorLe, Quoc Toan
dc.contributor.imecauthorKesters, Els
dc.contributor.imecauthorDecoster, Stefan
dc.contributor.imecauthorChan, BT
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorVanleenhove, Anja
dc.contributor.imecauthorHolsteyns, Frank
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecLe, Quoc Toan::0000-0002-0206-6279
dc.contributor.orcidimecDecoster, Stefan::0000-0003-1162-9288
dc.contributor.orcidimecChan, BT::0000-0003-2890-0388
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.source.peerreviewyes
dc.source.beginpageN5
dc.source.endpageN9
dc.source.journalECS Journal of Solid State Science and Technology
dc.source.issue3
dc.source.volume5
dc.identifier.urlhttp://jss.ecsdl.org/content/5/3/N5.short
imec.availabilityPublished - imec


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