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Hybrid overlay metrology for high order correction by using CDSEM

dc.contributor.authorLeray, Philippe
dc.contributor.authorHalder, Sandip
dc.contributor.authorLorusso, Gian
dc.contributor.authorBaudemprez, Bart
dc.contributor.authorInoue, Osamu
dc.contributor.authorOkagawa, Yutaka
dc.date.accessioned2021-10-23T12:07:14Z
dc.date.available2021-10-23T12:07:14Z
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/26890
dc.sourceIIOimport
dc.titleHybrid overlay metrology for high order correction by using CDSEM
dc.typeProceedings paper
dc.contributor.imecauthorLeray, Philippe
dc.contributor.imecauthorHalder, Sandip
dc.contributor.imecauthorLorusso, Gian
dc.contributor.imecauthorBaudemprez, Bart
dc.contributor.orcidimecHalder, Sandip::0000-0002-6314-2685
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage977824
dc.source.conferenceMetrology, Inspection, and Process Control for Microlithography XXX
dc.source.conferencedate20/02/2016
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=2513664
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 9778


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