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Current and future requirements for metrology and inspection for advanced patterning

dc.contributor.authorLeray, Philippe
dc.contributor.authorWong, Patrick
dc.contributor.authorHalder, Sandip
dc.contributor.authorFoubert, Philippe
dc.date.accessioned2021-10-23T12:07:32Z
dc.date.available2021-10-23T12:07:32Z
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/26891
dc.sourceIIOimport
dc.titleCurrent and future requirements for metrology and inspection for advanced patterning
dc.typeProceedings paper
dc.contributor.imecauthorLeray, Philippe
dc.contributor.imecauthorWong, Patrick
dc.contributor.imecauthorHalder, Sandip
dc.contributor.imecauthorFoubert, Philippe
dc.contributor.orcidimecWong, Patrick::0000-0003-3605-9680
dc.contributor.orcidimecHalder, Sandip::0000-0002-6314-2685
dc.source.peerreviewno
dc.source.conference29th International Microprocesses and Nanotechnology Conference - IMNC
dc.source.conferencedate8/11/2016
dc.source.conferencelocationKyoto Japan
dc.identifier.urlhttp://imnc.jp/invited2016.html
imec.availabilityPublished - imec


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