dc.contributor.author | Leray, Philippe | |
dc.contributor.author | Wong, Patrick | |
dc.contributor.author | Halder, Sandip | |
dc.contributor.author | Foubert, Philippe | |
dc.date.accessioned | 2021-10-23T12:07:32Z | |
dc.date.available | 2021-10-23T12:07:32Z | |
dc.date.issued | 2016 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/26891 | |
dc.source | IIOimport | |
dc.title | Current and future requirements for metrology and inspection for advanced patterning | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Leray, Philippe | |
dc.contributor.imecauthor | Wong, Patrick | |
dc.contributor.imecauthor | Halder, Sandip | |
dc.contributor.imecauthor | Foubert, Philippe | |
dc.contributor.orcidimec | Wong, Patrick::0000-0003-3605-9680 | |
dc.contributor.orcidimec | Halder, Sandip::0000-0002-6314-2685 | |
dc.source.peerreview | no | |
dc.source.conference | 29th International Microprocesses and Nanotechnology Conference - IMNC | |
dc.source.conferencedate | 8/11/2016 | |
dc.source.conferencelocation | Kyoto Japan | |
dc.identifier.url | http://imnc.jp/invited2016.html | |
imec.availability | Published - imec | |