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Post-CMP cleaners for tungsten at advanced nodes

dc.contributor.authorLieten, Ruben
dc.contributor.authorWhite, Daniela
dc.contributor.authorParson, Thomas
dc.contributor.authorJenq, Shining
dc.contributor.authorFrye, Don
dc.contributor.authorWhite, Michael
dc.contributor.authorTeugels, Lieve
dc.contributor.authorStruyf, Herbert
dc.date.accessioned2021-10-23T12:14:22Z
dc.date.available2021-10-23T12:14:22Z
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/26912
dc.sourceIIOimport
dc.titlePost-CMP cleaners for tungsten at advanced nodes
dc.typeProceedings paper
dc.contributor.imecauthorLieten, Ruben
dc.contributor.imecauthorParson, Thomas
dc.contributor.imecauthorTeugels, Lieve
dc.contributor.imecauthorStruyf, Herbert
dc.contributor.orcidimecTeugels, Lieve::0000-0002-6613-9414
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.conferenceUltra Clean Processing of Semiconductor Surfaces XIII - UCPSS
dc.source.conferencedate11/09/2016
dc.source.conferencelocationKnokke-Heist Belgium
imec.availabilityPublished - open access


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