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Study of the initial substrate surface and nucleation process of InAs NW epitaxy on Si (111)

dc.contributor.authorLiu, Ziyang
dc.contributor.authorMerckling, Clement
dc.contributor.authorRooyackers, Rita
dc.contributor.authorFranquet, Alexis
dc.contributor.authorRichard, Olivier
dc.contributor.authorBender, Hugo
dc.contributor.authorVila Santos, Maria
dc.contributor.authorRubio-Zuazo, Juan
dc.contributor.authorCastro, Germán
dc.contributor.authorCollaert, Nadine
dc.contributor.authorThean, Aaron
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-10-23T12:17:39Z
dc.date.available2021-10-23T12:17:39Z
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/26921
dc.sourceIIOimport
dc.titleStudy of the initial substrate surface and nucleation process of InAs NW epitaxy on Si (111)
dc.typeOral presentation
dc.contributor.imecauthorMerckling, Clement
dc.contributor.imecauthorFranquet, Alexis
dc.contributor.imecauthorRichard, Olivier
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorCollaert, Nadine
dc.contributor.imecauthorThean, Aaron
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecMerckling, Clement::0000-0003-3084-2543
dc.contributor.orcidimecFranquet, Alexis::0000-0002-7371-8852
dc.contributor.orcidimecRichard, Olivier::0000-0002-3994-8021
dc.contributor.orcidimecCollaert, Nadine::0000-0002-8062-3165
dc.source.peerreviewno
dc.source.conferenceE-MRS Fall Meeting
dc.source.conferencedate19/09/2016
dc.source.conferencelocationWarsaw Poland
imec.availabilityPublished - imec


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