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Ge epitaxial growth in view of optical device applications

dc.contributor.authorLoo, Roger
dc.contributor.authorSrinivasan, Ashwyn
dc.contributor.authorShimura, Yosuke
dc.contributor.authorPorret, Clément
dc.contributor.authorVan Thourhout, Dries
dc.contributor.authorVan Deun, Rik
dc.contributor.authorStoica, Toma
dc.contributor.authorBuca, Dan
dc.contributor.authorVan Campenhout, Joris
dc.date.accessioned2021-10-23T12:20:37Z
dc.date.available2021-10-23T12:20:37Z
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/26929
dc.sourceIIOimport
dc.titleGe epitaxial growth in view of optical device applications
dc.typeMeeting abstract
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorSrinivasan, Ashwyn
dc.contributor.imecauthorPorret, Clément
dc.contributor.imecauthorVan Thourhout, Dries
dc.contributor.imecauthorVan Campenhout, Joris
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.contributor.orcidimecPorret, Clément::0000-0002-4561-348X
dc.contributor.orcidimecVan Thourhout, Dries::0000-0003-0111-431X
dc.contributor.orcidimecVan Campenhout, Joris::0000-0003-0778-2669
dc.source.peerreviewyes
dc.source.conference9th International Workshop on New Group IV Semiconductor Nanoelectronics and JSPS Core-to-Core Program Joint Seminar "Atomically
dc.source.conferencedate11/01/2016
dc.source.conferencelocationSendai Japan
imec.availabilityPublished - imec


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