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Optimized EUV mask absorber stack for improved imaging by reducing roughness and crystallinity of alternative absorber materials

dc.contributor.authorLuong, Vu
dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorHendrickx, Eric
dc.contributor.authorScholze, Frank
dc.contributor.authorvan de Kruijs, Robbert
dc.contributor.authorEdrisi, Arash
dc.contributor.authorWood, Obert
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-10-23T12:21:56Z
dc.date.available2021-10-23T12:21:56Z
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/26933
dc.sourceIIOimport
dc.titleOptimized EUV mask absorber stack for improved imaging by reducing roughness and crystallinity of alternative absorber materials
dc.typeProceedings paper
dc.contributor.imecauthorLuong, Vu
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.source.peerreviewno
dc.source.conferenceInternational Symposium on Extreme Ultraviolet Lithography
dc.source.conferencedate24/10/2016
dc.source.conferencelocationHiroshima Japan
imec.availabilityPublished - imec


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