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EUVL introduction impact on development cycle for advanced technology

dc.contributor.authorMallik, Arindam
dc.contributor.authorRyckaert, Julien
dc.contributor.authorRonse, Kurt
dc.contributor.authorVerkest, Diederik
dc.contributor.authorThean, Aaron
dc.date.accessioned2021-10-23T12:28:54Z
dc.date.available2021-10-23T12:28:54Z
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/26953
dc.sourceIIOimport
dc.titleEUVL introduction impact on development cycle for advanced technology
dc.typeMeeting abstract
dc.contributor.imecauthorMallik, Arindam
dc.contributor.imecauthorRyckaert, Julien
dc.contributor.imecauthorRonse, Kurt
dc.contributor.imecauthorVerkest, Diederik
dc.contributor.imecauthorThean, Aaron
dc.contributor.orcidimecMallik, Arindam::0000-0002-0742-9366
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.contributor.orcidimecVerkest, Diederik::0000-0001-6567-2746
dc.source.peerreviewno
dc.source.conferenceSPIE Advanced lithography - Extreme Ultraviolet (EUV) Lithography VII
dc.source.conferencedate21/02/2016
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - imec


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