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Multi-step reaction mechanism for F atom interactions with organosilicate glass and SiOx films

dc.contributor.authorMankelevich, Y.
dc.contributor.authorVoronina, E.
dc.contributor.authorRakhimova, T.
dc.contributor.authorPalov, A.
dc.contributor.authorLopaev, D.V.
dc.contributor.authorZyryanov, S.M.
dc.contributor.authorBaklanov, Mikhaïl
dc.date.accessioned2021-10-23T12:30:11Z
dc.date.available2021-10-23T12:30:11Z
dc.date.issued2016
dc.identifier.issn0022-3727
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/26956
dc.sourceIIOimport
dc.titleMulti-step reaction mechanism for F atom interactions with organosilicate glass and SiOx films
dc.typeJournal article
dc.source.peerreviewyes
dc.source.beginpage345203
dc.source.journalJournal of Physics D: Applied Physics
dc.source.issue34
dc.source.volume49
dc.identifier.urlhttp://iopscience.iop.org/article/10.1088/0022-3727/49/34/345203/meta
imec.availabilityPublished - imec


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