Show simple item record

Effect of dilute hydrogen peroxide in ultrapure water on SiGe epitaxial process

dc.contributor.authorMasaoka, Toru
dc.contributor.authorGan, Nobuko
dc.contributor.authorFujimura, Yu
dc.contributor.authorOgawa, Yuichi
dc.contributor.authorWostyn, Kurt
dc.contributor.authorPacco, Antoine
dc.contributor.authorYoshida, Yukifuni
dc.contributor.authorHolsteyns, Frank
dc.date.accessioned2021-10-23T12:37:22Z
dc.date.available2021-10-23T12:37:22Z
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/26976
dc.sourceIIOimport
dc.titleEffect of dilute hydrogen peroxide in ultrapure water on SiGe epitaxial process
dc.typeProceedings paper
dc.contributor.imecauthorWostyn, Kurt
dc.contributor.imecauthorPacco, Antoine
dc.contributor.imecauthorHolsteyns, Frank
dc.contributor.orcidimecWostyn, Kurt::0000-0003-3995-0292
dc.source.peerreviewyes
dc.source.beginpage27
dc.source.endpage30
dc.source.conferenceUltra Clean Processing of Semiconductor Surfaces XIII
dc.source.conferencedate11/09/2016
dc.source.conferencelocationKnokke Belgium
dc.identifier.urlhttp://www.scientific.net/SSP.255.27
imec.availabilityPublished - imec
imec.internalnotesSolid State Phenomena; Vol. 255


Files in this item

FilesSizeFormatView

There are no files associated with this item.

This item appears in the following collection(s)

Show simple item record