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A 2nd generation of 14/16nm-node compatible strained-Ge pFINFET with improved performance with respect to advanced Si-channel FinFETs
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A 2nd generation of 14/16nm-node compatible strained-Ge pFINFET with improved performance with respect to advanced Si-channel FinFETs
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Date
2016
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Mitard, Jerome
;
Witters, Liesbeth
;
Sasaki, Yuichiro
;
Arimura, Hiroaki
;
Schulze, Andreas
;
Loo, Roger
;
Ragnarsson, Lars-Ake
;
Hikavyy, Andriy
;
Cott, Daire
;
Chiarella, Thomas
;
Kubicek, Stefan
;
Mertens, Hans
;
Ritzenthaler, Romain
;
Vrancken, Christa
;
Favia, Paola
;
Bender, Hugo
;
Horiguchi, Naoto
;
Barla, Kathy
;
Mocuta, Dan
;
Mocuta, Anda
;
Collaert, Nadine
;
Thean, Aaron
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since deposited on 2021-10-23
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