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Assist features: placement, impact and relevance

dc.contributor.authorMochi, Iacopo
dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorGallagher, Emily
dc.contributor.authorHendrickx, Eric
dc.contributor.authorLyakhova, Kateryna
dc.contributor.authorWittebrood, Friso
dc.contributor.authorSchiffelers, Guido
dc.contributor.authorFliervoet, Timon
dc.contributor.authorWang, Shibing
dc.contributor.authorHsu, Stephen
dc.contributor.authorPlachecki, Vince
dc.contributor.authorBaron, Stan
dc.contributor.authorLaenens, Bart
dc.date.accessioned2021-10-23T12:54:49Z
dc.date.available2021-10-23T12:54:49Z
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/27022
dc.sourceIIOimport
dc.titleAssist features: placement, impact and relevance
dc.typeProceedings paper
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.imecauthorGallagher, Emily
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.imecauthorLyakhova, Kateryna
dc.contributor.imecauthorSchiffelers, Guido
dc.contributor.imecauthorFliervoet, Timon
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.contributor.orcidimecGallagher, Emily::0000-0002-2927-8298
dc.contributor.orcidimecHendrickx, Eric::0000-0003-2516-0417
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage97761S
dc.source.conferenceExtreme Ultraviolet (EUV) Lithography VII
dc.source.conferencedate21/02/2016
dc.source.conferencelocationSan Jose, California, USA
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=2505811&resultClick=1
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 9776


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