dc.contributor.author | Neumann, J.T. | |
dc.contributor.author | Garaboski, T. | |
dc.contributor.author | Halder, Sandip | |
dc.contributor.author | Leray, Philippe | |
dc.contributor.author | Garreis, R. | |
dc.contributor.author | Zeidler, D. | |
dc.date.accessioned | 2021-10-23T13:14:13Z | |
dc.date.available | 2021-10-23T13:14:13Z | |
dc.date.issued | 2016 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/27073 | |
dc.source | IIOimport | |
dc.title | Imaging semiconductor patterns at N10 logic node with a high-throughput multi-beam SEM | |
dc.type | Meeting abstract | |
dc.contributor.imecauthor | Halder, Sandip | |
dc.contributor.imecauthor | Leray, Philippe | |
dc.contributor.orcidimec | Halder, Sandip::0000-0002-6314-2685 | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 3B3 | |
dc.source.conference | 60th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication - EIPBN | |
dc.source.conferencedate | 31/05/2016 | |
dc.source.conferencelocation | Pittsburgh, PA USA | |
imec.availability | Published - open access | |