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Impact of the filament morphology on the retention characteristics of Cu/Al2O3-based CBRAM devices

dc.contributor.authorOta, Kensuke
dc.contributor.authorBelmonte, Attilio
dc.contributor.authorChen, Zhe
dc.contributor.authorRedolfi, Augusto
dc.contributor.authorGoux, Ludovic
dc.contributor.authorKar, Gouri Sankar
dc.date.accessioned2021-10-23T13:25:18Z
dc.date.available2021-10-23T13:25:18Z
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/27101
dc.sourceIIOimport
dc.titleImpact of the filament morphology on the retention characteristics of Cu/Al2O3-based CBRAM devices
dc.typeProceedings paper
dc.contributor.imecauthorBelmonte, Attilio
dc.contributor.imecauthorRedolfi, Augusto
dc.contributor.imecauthorGoux, Ludovic
dc.contributor.imecauthorKar, Gouri Sankar
dc.contributor.orcidimecGoux, Ludovic::0000-0002-1276-2278
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage556
dc.source.endpage559
dc.source.conferenceIEEE International Electron Devices Meeting - IEDM
dc.source.conferencedate3/12/2016
dc.source.conferencelocationSan Francisco, CA USA
imec.availabilityPublished - open access


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