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Phase analysis and thermal stability of thin films synthesized via solid state reaction of Ni with Si1-xGex substrate

dc.contributor.authorPeter, Antony
dc.contributor.authorWitters, Thomas
dc.contributor.authorDutta, Shibesh
dc.contributor.authorHikavyy, Andriy
dc.contributor.authorVaesen, Inge
dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorSchaekers, Marc
dc.date.accessioned2021-10-23T13:37:57Z
dc.date.available2021-10-23T13:37:57Z
dc.date.issued2016
dc.identifier.issn0167-9317
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/27131
dc.sourceIIOimport
dc.titlePhase analysis and thermal stability of thin films synthesized via solid state reaction of Ni with Si1-xGex substrate
dc.typeJournal article
dc.contributor.imecauthorPeter, Antony
dc.contributor.imecauthorWitters, Thomas
dc.contributor.imecauthorHikavyy, Andriy
dc.contributor.imecauthorVaesen, Inge
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.imecauthorSchaekers, Marc
dc.contributor.orcidimecHikavyy, Andriy::0000-0002-8201-075X
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.contributor.orcidimecSchaekers, Marc::0000-0002-1496-7816
dc.source.peerreviewyes
dc.source.beginpage46
dc.source.endpage51
dc.source.journalMicroelectronic Engineering
dc.source.volume149
dc.identifier.urlhttp://www.sciencedirect.com/science/article/pii/S016793171530054X
imec.availabilityPublished - imec


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