dc.contributor.author | Peter, Antony | |
dc.contributor.author | Yu, Hao | |
dc.contributor.author | Dutta, Shibesh | |
dc.contributor.author | Rosseel, Erik | |
dc.contributor.author | Van Elshocht, Sven | |
dc.contributor.author | Paulussen, Kris | |
dc.contributor.author | Moussa, Alain | |
dc.contributor.author | Vaesen, Inge | |
dc.contributor.author | Schaekers, Marc | |
dc.date.accessioned | 2021-10-23T13:38:24Z | |
dc.date.available | 2021-10-23T13:38:24Z | |
dc.date.issued | 2016 | |
dc.identifier.issn | 0167-9317 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/27132 | |
dc.source | IIOimport | |
dc.title | Characterization of ultra-thin nickel-silicide films synthesized using the solid state reaction of Ni with an underlying Si:P substrate (P: 0.7 to 4.0%) | |
dc.type | Journal article | |
dc.contributor.imecauthor | Peter, Antony | |
dc.contributor.imecauthor | Yu, Hao | |
dc.contributor.imecauthor | Rosseel, Erik | |
dc.contributor.imecauthor | Van Elshocht, Sven | |
dc.contributor.imecauthor | Paulussen, Kris | |
dc.contributor.imecauthor | Moussa, Alain | |
dc.contributor.imecauthor | Vaesen, Inge | |
dc.contributor.imecauthor | Schaekers, Marc | |
dc.contributor.orcidimec | Yu, Hao::0000-0002-1976-0259 | |
dc.contributor.orcidimec | Van Elshocht, Sven::0000-0002-6512-1909 | |
dc.contributor.orcidimec | Paulussen, Kris::0000-0002-8945-2438 | |
dc.contributor.orcidimec | Schaekers, Marc::0000-0002-1496-7816 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 52 | |
dc.source.endpage | 59 | |
dc.source.journal | Microelectronic Engineering | |
dc.source.volume | 157 | |
dc.identifier.url | http://www.sciencedirect.com/science/article/pii/S0167931716300910 | |
imec.availability | Published - imec | |