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Characterization of ultra-thin nickel-silicide films synthesized using the solid state reaction of Ni with an underlying Si:P substrate (P: 0.7 to 4.0%)

dc.contributor.authorPeter, Antony
dc.contributor.authorYu, Hao
dc.contributor.authorDutta, Shibesh
dc.contributor.authorRosseel, Erik
dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorPaulussen, Kris
dc.contributor.authorMoussa, Alain
dc.contributor.authorVaesen, Inge
dc.contributor.authorSchaekers, Marc
dc.date.accessioned2021-10-23T13:38:24Z
dc.date.available2021-10-23T13:38:24Z
dc.date.issued2016
dc.identifier.issn0167-9317
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/27132
dc.sourceIIOimport
dc.titleCharacterization of ultra-thin nickel-silicide films synthesized using the solid state reaction of Ni with an underlying Si:P substrate (P: 0.7 to 4.0%)
dc.typeJournal article
dc.contributor.imecauthorPeter, Antony
dc.contributor.imecauthorYu, Hao
dc.contributor.imecauthorRosseel, Erik
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.imecauthorPaulussen, Kris
dc.contributor.imecauthorMoussa, Alain
dc.contributor.imecauthorVaesen, Inge
dc.contributor.imecauthorSchaekers, Marc
dc.contributor.orcidimecYu, Hao::0000-0002-1976-0259
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.contributor.orcidimecPaulussen, Kris::0000-0002-8945-2438
dc.contributor.orcidimecSchaekers, Marc::0000-0002-1496-7816
dc.source.peerreviewyes
dc.source.beginpage52
dc.source.endpage59
dc.source.journalMicroelectronic Engineering
dc.source.volume157
dc.identifier.urlhttp://www.sciencedirect.com/science/article/pii/S0167931716300910
imec.availabilityPublished - imec


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