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Characterization of ultra-thin nickel-silicide films synthesized using the solid state reaction of Ni with an underlying Si:P substrate (P: 0.7 to 4.0%)
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1913 since deposited on 2021-10-23
1last month
Acq. date: 2026-01-07
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Views
1913 since deposited on 2021-10-23
1last month
Acq. date: 2026-01-07
Citations