Characterization of ultra-thin nickel-silicide films synthesized using the solid state reaction of Ni with an underlying Si:P substrate (P: 0.7 to 4.0%)

dc.contributor.author	Peter, Antony
dc.contributor.author	Yu, Hao
dc.contributor.author	Dutta, Shibesh
dc.contributor.author	Rosseel, Erik
dc.contributor.author	Van Elshocht, Sven
dc.contributor.author	Paulussen, Kris
dc.contributor.author	Moussa, Alain
dc.contributor.author	Vaesen, Inge
dc.contributor.author	Schaekers, Marc
dc.contributor.imecauthor	Peter, Antony
dc.contributor.imecauthor	Yu, Hao
dc.contributor.imecauthor	Rosseel, Erik
dc.contributor.imecauthor	Van Elshocht, Sven
dc.contributor.imecauthor	Paulussen, Kris
dc.contributor.imecauthor	Moussa, Alain
dc.contributor.imecauthor	Vaesen, Inge
dc.contributor.imecauthor	Schaekers, Marc
dc.contributor.orcidimec	Yu, Hao::0000-0002-1976-0259
dc.contributor.orcidimec	Van Elshocht, Sven::0000-0002-6512-1909
dc.contributor.orcidimec	Paulussen, Kris::0000-0002-8945-2438
dc.contributor.orcidimec	Schaekers, Marc::0000-0002-1496-7816
dc.date.accessioned	2021-10-23T13:38:24Z
dc.date.available	2021-10-23T13:38:24Z
dc.date.issued	2016
dc.identifier.issn	0167-9317
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/27132
dc.identifier.url	http://www.sciencedirect.com/science/article/pii/S0167931716300910
dc.source.beginpage	52
dc.source.endpage	59
dc.source.journal	Microelectronic Engineering
dc.source.volume	157
dc.title	Characterization of ultra-thin nickel-silicide films synthesized using the solid state reaction of Ni with an underlying Si:P substrate (P: 0.7 to 4.0%)
dc.type	Journal article
dspace.entity.type	Publication
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