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EUV lithography imaging using novel pellicle membranes

dc.contributor.authorPollentier, Ivan
dc.contributor.authorVanpaemel, Johannes
dc.contributor.authorLee, Jae Uk
dc.contributor.authorAdelmann, Christoph
dc.contributor.authorZahedmanesh, Houman
dc.contributor.authorHuyghebaert, Cedric
dc.contributor.authorGallagher, Emily
dc.date.accessioned2021-10-23T13:48:33Z
dc.date.available2021-10-23T13:48:33Z
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/27157
dc.sourceIIOimport
dc.titleEUV lithography imaging using novel pellicle membranes
dc.typeProceedings paper
dc.contributor.imecauthorPollentier, Ivan
dc.contributor.imecauthorLee, Jae Uk
dc.contributor.imecauthorAdelmann, Christoph
dc.contributor.imecauthorZahedmanesh, Houman
dc.contributor.imecauthorHuyghebaert, Cedric
dc.contributor.imecauthorGallagher, Emily
dc.contributor.orcidimecPollentier, Ivan::0000-0002-4266-6500
dc.contributor.orcidimecLee, Jae Uk::0000-0002-9434-5055
dc.contributor.orcidimecAdelmann, Christoph::0000-0002-4831-3159
dc.contributor.orcidimecHuyghebaert, Cedric::0000-0001-6043-7130
dc.contributor.orcidimecGallagher, Emily::0000-0002-2927-8298
dc.source.peerreviewyes
dc.source.beginpage977620
dc.source.conferenceExtreme Ultraviolet (EUV) Lithography VII
dc.source.conferencedate21/02/2016
dc.source.conferencelocationBellingham, WA USA
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=2505818
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 9776


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