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Wafer-scale growth of graphene on Ge and Si wafers by reduced-pressure chemical vapor deposition

dc.contributor.authorPorret, Clément
dc.contributor.authorLuraschi, Claudio
dc.contributor.authorNuytten, Thomas
dc.contributor.authorVanhaeren, Danielle
dc.contributor.authorConard, Thierry
dc.contributor.authorVerguts, Ken
dc.contributor.authorBrems, Steven
dc.contributor.authorCaymax, Matty
dc.contributor.authorLanger, Robert
dc.contributor.authorLoo, Roger
dc.date.accessioned2021-10-23T13:51:32Z
dc.date.available2021-10-23T13:51:32Z
dc.date.issued2016-11
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/27165
dc.sourceIIOimport
dc.titleWafer-scale growth of graphene on Ge and Si wafers by reduced-pressure chemical vapor deposition
dc.typeMeeting abstract
dc.contributor.imecauthorPorret, Clément
dc.contributor.imecauthorNuytten, Thomas
dc.contributor.imecauthorVanhaeren, Danielle
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorBrems, Steven
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorLanger, Robert
dc.contributor.imecauthorLoo, Roger
dc.contributor.orcidimecPorret, Clément::0000-0002-4561-348X
dc.contributor.orcidimecNuytten, Thomas::0000-0002-5921-6928
dc.contributor.orcidimecVanhaeren, Danielle::0000-0001-8624-9533
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecBrems, Steven::0000-0002-0282-8528
dc.contributor.orcidimecLanger, Robert::0000-0002-1132-3468
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.source.peerreviewyes
dc.source.beginpage32
dc.source.endpage33
dc.source.conferenceJSPS - FZ-Jülich Workshop on "Atomically Controlled Processing for Ultra-large Scale Integration"
dc.source.conferencedate24/11/2016
dc.source.conferencelocationJülich Germany
imec.availabilityPublished - imec


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