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Top-down InGaAs nanowire and Fin vertical FETs with record performance

dc.contributor.authorRamesh, Siva
dc.contributor.authorIvanov, Tsvetan
dc.contributor.authorCamerotto, Elisabeth
dc.contributor.authorSun, N.
dc.contributor.authorFranco, Jacopo
dc.contributor.authorSibaja-Hernandez, Arturo
dc.contributor.authorRooyackers, Rita
dc.contributor.authorAlian, AliReza
dc.contributor.authorLoo, Josine
dc.contributor.authorVeloso, Anabela
dc.contributor.authorMilenin, Alexey
dc.contributor.authorLin, Dennis
dc.contributor.authorFavia, Paola
dc.contributor.authorBender, Hugo
dc.contributor.authorCollaert, Nadine
dc.contributor.authorThean, Aaron
dc.contributor.authorDe Meyer, Kristin
dc.date.accessioned2021-10-23T14:02:11Z
dc.date.available2021-10-23T14:02:11Z
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/27190
dc.sourceIIOimport
dc.titleTop-down InGaAs nanowire and Fin vertical FETs with record performance
dc.typeProceedings paper
dc.contributor.imecauthorRamesh, Siva
dc.contributor.imecauthorIvanov, Tsvetan
dc.contributor.imecauthorCamerotto, Elisabeth
dc.contributor.imecauthorFranco, Jacopo
dc.contributor.imecauthorSibaja-Hernandez, Arturo
dc.contributor.imecauthorAlian, AliReza
dc.contributor.imecauthorVeloso, Anabela
dc.contributor.imecauthorMilenin, Alexey
dc.contributor.imecauthorLin, Dennis
dc.contributor.imecauthorFavia, Paola
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorCollaert, Nadine
dc.contributor.imecauthorThean, Aaron
dc.contributor.imecauthorDe Meyer, Kristin
dc.contributor.orcidimecRamesh, Siva::0000-0002-8473-7258
dc.contributor.orcidimecIvanov, Tsvetan::0000-0003-3407-2742
dc.contributor.orcidimecFranco, Jacopo::0000-0002-7382-8605
dc.contributor.orcidimecMilenin, Alexey::0000-0003-0747-0462
dc.contributor.orcidimecFavia, Paola::0000-0002-1019-3497
dc.contributor.orcidimecCollaert, Nadine::0000-0002-8062-3165
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage164
dc.source.endpage165
dc.source.conferenceSymposium on VLSI Technology
dc.source.conferencedate13/06/2016
dc.source.conferencelocationHonolulu, HI USA
imec.availabilityPublished - open access


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