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Two-step p-MTJ patterning schemes for low density, high yield STT-MRAM devices for embedded applications

dc.contributor.authorRao, Siddharth
dc.contributor.authorSouriau, Laurent
dc.contributor.authorCrotti, Davide
dc.contributor.authorSwerts, Johan
dc.contributor.authorKim, Woojin
dc.contributor.authorKundu, Shreya
dc.contributor.authorDonadio, Gabriele Luca
dc.contributor.authorCouet, Sebastien
dc.contributor.authorFurnemont, Arnaud
dc.contributor.authorKar, Gouri Sankar
dc.date.accessioned2021-10-23T14:03:30Z
dc.date.available2021-10-23T14:03:30Z
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/27193
dc.sourceIIOimport
dc.titleTwo-step p-MTJ patterning schemes for low density, high yield STT-MRAM devices for embedded applications
dc.typeOral presentation
dc.contributor.imecauthorRao, Siddharth
dc.contributor.imecauthorSouriau, Laurent
dc.contributor.imecauthorCrotti, Davide
dc.contributor.imecauthorSwerts, Johan
dc.contributor.imecauthorKim, Woojin
dc.contributor.imecauthorKundu, Shreya
dc.contributor.imecauthorDonadio, Gabriele Luca
dc.contributor.imecauthorCouet, Sebastien
dc.contributor.imecauthorFurnemont, Arnaud
dc.contributor.imecauthorKar, Gouri Sankar
dc.contributor.orcidimecRao, Siddharth::0000-0001-6161-3052
dc.contributor.orcidimecSouriau, Laurent::0000-0002-5138-5938
dc.contributor.orcidimecCouet, Sebastien::0000-0001-6436-9593
dc.contributor.orcidimecFurnemont, Arnaud::0000-0002-6378-1030
dc.source.peerreviewno
dc.source.conferenceIEDM
dc.source.conferencedate4/12/2016
dc.source.conferencelocationSan Francisco, CA USA
imec.availabilityPublished - imec
imec.internalnotesThe poster was displayed in a special MRAM poster session at IEDM (only 30 posters selected worldwide).


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