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Evaluation of post metal etch cleaning by analyzing chemical compositions and distributions

dc.contributor.authorLi, H.
dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorBoullart, Werner
dc.contributor.authorConard, Thierry
dc.contributor.authorBrijs, Bert
dc.contributor.authorMaex, Karen
dc.contributor.authorFroyen, L.
dc.date.accessioned2021-10-01T08:28:59Z
dc.date.available2021-10-01T08:28:59Z
dc.date.issued1998
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/2720
dc.sourceIIOimport
dc.titleEvaluation of post metal etch cleaning by analyzing chemical compositions and distributions
dc.typeOral presentation
dc.contributor.imecauthorBoullart, Werner
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorMaex, Karen
dc.contributor.orcidimecBoullart, Werner::0000-0001-7614-2097
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.source.peerreviewno
dc.source.conference4th International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSS
dc.source.conferencedate21/09/1998
dc.source.conferencelocationOostende Belgium
imec.availabilityPublished - imec
imec.internalnotesPubl. in 1999; C3583


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