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Strained c:Si0.55Ge0.45 with Embedded e:Si0.75Ge0.25 S/D IFQW SiGe-pFET for DRAM periphery applications

dc.contributor.authorRitzenthaler, Romain
dc.contributor.authorSchram, Tom
dc.contributor.authorWitters, Liesbeth
dc.contributor.authorMitard, Jerome
dc.contributor.authorSpessot, Alessio
dc.contributor.authorCaillat, Christian
dc.contributor.authorHellings, Geert
dc.contributor.authorEneman, Geert
dc.contributor.authorAoulaiche, Marc
dc.contributor.authorNa, Hoon Joo
dc.contributor.authorSon, Yunik
dc.contributor.authorNoh, Kyung Bong
dc.contributor.authorFazan, Pierre
dc.contributor.authorLee, Sun Ghil
dc.contributor.authorCollaert, Nadine
dc.contributor.authorMocuta, Anda
dc.contributor.authorHoriguchi, Naoto
dc.contributor.authorThean, Aaron
dc.date.accessioned2021-10-23T14:15:18Z
dc.date.available2021-10-23T14:15:18Z
dc.date.issued2016
dc.identifier.issn1369-8001
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/27220
dc.sourceIIOimport
dc.titleStrained c:Si0.55Ge0.45 with Embedded e:Si0.75Ge0.25 S/D IFQW SiGe-pFET for DRAM periphery applications
dc.typeJournal article
dc.contributor.imecauthorRitzenthaler, Romain
dc.contributor.imecauthorSchram, Tom
dc.contributor.imecauthorWitters, Liesbeth
dc.contributor.imecauthorMitard, Jerome
dc.contributor.imecauthorSpessot, Alessio
dc.contributor.imecauthorHellings, Geert
dc.contributor.imecauthorEneman, Geert
dc.contributor.imecauthorFazan, Pierre
dc.contributor.imecauthorCollaert, Nadine
dc.contributor.imecauthorHoriguchi, Naoto
dc.contributor.imecauthorThean, Aaron
dc.contributor.orcidimecRitzenthaler, Romain::0000-0002-8615-3272
dc.contributor.orcidimecSchram, Tom::0000-0003-1533-7055
dc.contributor.orcidimecMitard, Jerome::0000-0002-7422-079X
dc.contributor.orcidimecHellings, Geert::0000-0002-5376-2119
dc.contributor.orcidimecEneman, Geert::0000-0002-5849-3384
dc.contributor.orcidimecCollaert, Nadine::0000-0002-8062-3165
dc.contributor.orcidimecHoriguchi, Naoto::0000-0001-5490-0416
dc.source.peerreviewyes
dc.source.beginpage255
dc.source.endpage258
dc.source.journalMaterials Science in Semiconductor Processing
dc.source.issue2
dc.source.volume42
dc.identifier.urlhttp://www.sciencedirect.com/science/article/pii/S1369800115300998
imec.availabilityPublished - imec


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