dc.contributor.author | Sayan, Safak | |
dc.contributor.author | Lin, Dennis | |
dc.contributor.author | Asselberghs, Inge | |
dc.contributor.author | Chiappe, Daniele | |
dc.contributor.author | Sutar, Surajit | |
dc.contributor.author | Radu, Iuliana | |
dc.contributor.author | Thean, Aaron | |
dc.contributor.author | Petermann, Claire | |
dc.contributor.author | Hong, Sung Eun | |
dc.date.accessioned | 2021-10-23T14:37:54Z | |
dc.date.available | 2021-10-23T14:37:54Z | |
dc.date.issued | 2016 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/27272 | |
dc.source | IIOimport | |
dc.title | Dielectric properties of spin-on metal oxides and their applications for 2D semiconductor devices | |
dc.type | Oral presentation | |
dc.contributor.imecauthor | Lin, Dennis | |
dc.contributor.imecauthor | Asselberghs, Inge | |
dc.contributor.imecauthor | Sutar, Surajit | |
dc.contributor.imecauthor | Radu, Iuliana | |
dc.contributor.imecauthor | Thean, Aaron | |
dc.contributor.imecauthor | Petermann, Claire | |
dc.contributor.orcidimec | Radu, Iuliana::0000-0002-7230-7218 | |
dc.source.peerreview | no | |
dc.source.conference | SPIE Advanced Lithography Conference | |
dc.source.conferencedate | 22/02/2016 | |
dc.source.conferencelocation | San Jose, CA USA | |
dc.identifier.url | https://spie.org/AL16/conferencedetails/advances-resist-patterning-materials-processes | |
imec.availability | Published - imec | |
imec.internalnotes | 9779-19 | |