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EUV extendibility via dry development rinse process

dc.contributor.authorSayan, Safak
dc.contributor.authorTao, Zheng
dc.contributor.authorDe Simone, Danilo
dc.contributor.authorVandenberghe, Geert
dc.date.accessioned2021-10-23T14:38:51Z
dc.date.available2021-10-23T14:38:51Z
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/27274
dc.sourceIIOimport
dc.titleEUV extendibility via dry development rinse process
dc.typeProceedings paper
dc.contributor.imecauthorTao, Zheng
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage977610
dc.source.conferenceExtreme Ultraviolet (EUV) Lithography VII
dc.source.conferencedate22/02/2016
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=2513824
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 9776


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