dc.contributor.author | Simoen, Eddy | |
dc.contributor.author | Ritzenthaler, Romain | |
dc.contributor.author | Cho, Moon Ju | |
dc.contributor.author | Schram, Tom | |
dc.contributor.author | Horiguchi, Naoto | |
dc.contributor.author | Aoulaiche, Marc | |
dc.contributor.author | Spessot, Alessio | |
dc.contributor.author | Fazan, Pierre | |
dc.contributor.author | Claeys, Cor | |
dc.date.accessioned | 2021-10-23T14:59:35Z | |
dc.date.available | 2021-10-23T14:59:35Z | |
dc.date.issued | 2016 | |
dc.identifier.issn | 2162-8769 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/27321 | |
dc.source | IIOimport | |
dc.title | Low-frequency noise assessment of the oxide trap density in thick-oxide input-output transistors for DRAM applications | |
dc.type | Journal article | |
dc.contributor.imecauthor | Simoen, Eddy | |
dc.contributor.imecauthor | Ritzenthaler, Romain | |
dc.contributor.imecauthor | Schram, Tom | |
dc.contributor.imecauthor | Horiguchi, Naoto | |
dc.contributor.imecauthor | Spessot, Alessio | |
dc.contributor.imecauthor | Fazan, Pierre | |
dc.contributor.orcidimec | Simoen, Eddy::0000-0002-5218-4046 | |
dc.contributor.orcidimec | Ritzenthaler, Romain::0000-0002-8615-3272 | |
dc.contributor.orcidimec | Schram, Tom::0000-0003-1533-7055 | |
dc.contributor.orcidimec | Horiguchi, Naoto::0000-0001-5490-0416 | |
dc.source.peerreview | yes | |
dc.source.beginpage | N27 | |
dc.source.endpage | N31 | |
dc.source.journal | ECS Journal of Solid State Science and Technology | |
dc.source.issue | 6 | |
dc.source.volume | 5 | |
dc.identifier.url | http://jss.ecsdl.org/content/5/6/N27.abstract | |
imec.availability | Published - imec | |