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Phosphorus doped Ge layers for optical applications

dc.contributor.authorSrinivasan, Ashwyn
dc.contributor.authorPrabhulinga, Ashwini
dc.contributor.authorPorret, Clément
dc.contributor.authorShimura, Yosuke
dc.contributor.authorVan Thourhout, Dries
dc.contributor.authorPantouvaki, Marianna
dc.contributor.authorLoo, Roger
dc.contributor.authorVan Campenhout, Joris
dc.date.accessioned2021-10-23T15:11:31Z
dc.date.available2021-10-23T15:11:31Z
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/27346
dc.sourceIIOimport
dc.titlePhosphorus doped Ge layers for optical applications
dc.typeMeeting abstract
dc.contributor.imecauthorSrinivasan, Ashwyn
dc.contributor.imecauthorPorret, Clément
dc.contributor.imecauthorVan Thourhout, Dries
dc.contributor.imecauthorPantouvaki, Marianna
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorVan Campenhout, Joris
dc.contributor.orcidimecPorret, Clément::0000-0002-4561-348X
dc.contributor.orcidimecVan Thourhout, Dries::0000-0003-0111-431X
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.contributor.orcidimecVan Campenhout, Joris::0000-0003-0778-2669
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage15
dc.source.endpage16
dc.source.conferenceJSPS - FZ-Jülich Workshop on "Atomically Controlled Processing for Ultra-large Scale Integration"
dc.source.conferencedate24/11/2016
dc.source.conferencelocationJülich Germany
imec.availabilityPublished - imec


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