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Optimized rinsing for low metallic contamination

dc.contributor.authorLoewenstein, Lee
dc.contributor.authorMertens, Paul
dc.date.accessioned2021-10-01T08:29:09Z
dc.date.available2021-10-01T08:29:09Z
dc.date.issued1998
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/2736
dc.sourceIIOimport
dc.titleOptimized rinsing for low metallic contamination
dc.typeProceedings paper
dc.contributor.imecauthorMertens, Paul
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage89
dc.source.endpage96
dc.source.conferenceProceedings of the 5th International Symposium on Cleaning Technology in Semiconductor Device Manufacturing
dc.source.conferencedate31/08/1997
dc.source.conferencelocationParis France
imec.availabilityPublished - open access
imec.internalnotesElectrochemical Society Proceedings; Vol. 97-35


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