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Characterizing and modeling electrical response to light for metal based EUV photoresists

dc.contributor.authorVaglio Pret, Alessandro
dc.contributor.authorKocsis, Michael
dc.contributor.authorDe Simone, Danilo
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorStowers, Jason
dc.contributor.authorGiglia, Angelo
dc.contributor.authorDe Schepper, Peter
dc.contributor.authorMani, Antonio
dc.contributor.authorBiafore, John J.
dc.date.accessioned2021-10-23T15:47:23Z
dc.date.available2021-10-23T15:47:23Z
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/27421
dc.sourceIIOimport
dc.titleCharacterizing and modeling electrical response to light for metal based EUV photoresists
dc.typeProceedings paper
dc.contributor.imecauthorVaglio Pret, Alessandro
dc.contributor.imecauthorKocsis, Michael
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.imecauthorDe Schepper, Peter
dc.contributor.imecauthorMani, Antonio
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.source.peerreviewyes
dc.source.beginpage977906
dc.source.conferenceAdvances in Patterning Materials and Processes XXXIII
dc.source.conferencedate21/02/2016
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=2508622
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; VOl. 9779


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