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Process window discovery methodology development for advanced lithography

dc.contributor.authorVan Den Heuvel, Dieter
dc.contributor.authorFoubert, Philippe
dc.contributor.authorBaudemprez, Bart
dc.contributor.authorLee, Angelica
dc.contributor.authorCross, Andrew
dc.contributor.authorSao, Kaushik
dc.contributor.authorHaque, Naoshin
dc.contributor.authorParisi, Paolo
dc.contributor.authorBaris, Oksin
dc.date.accessioned2021-10-23T15:59:12Z
dc.date.available2021-10-23T15:59:12Z
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/27446
dc.sourceIIOimport
dc.titleProcess window discovery methodology development for advanced lithography
dc.typeProceedings paper
dc.contributor.imecauthorVan Den Heuvel, Dieter
dc.contributor.imecauthorFoubert, Philippe
dc.contributor.imecauthorBaudemprez, Bart
dc.contributor.imecauthorCross, Andrew
dc.contributor.imecauthorParisi, Paolo
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage65
dc.source.endpage71
dc.source.conference27th Annual SEMI Advanced Semiconductor Manufacturing Conference - ASMC
dc.source.conferencedate16/05/2016
dc.source.conferencelocationSaratoga Springs, NY USA
dc.identifier.urlhttp://ieeexplore.ieee.org/document/7491105/
imec.availabilityPublished - open access


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