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Control and impact of processing ambient during rapid thermal silicidation

dc.contributor.authorMaex, Karen
dc.contributor.authorKondoh, Eiichi
dc.contributor.authorLauwers, Anne
dc.contributor.authorSteegen, An
dc.contributor.authorde Potter de ten Broeck, Muriel
dc.contributor.authorBesser, Paul
dc.contributor.authorProost, Joris
dc.date.accessioned2021-10-01T08:29:34Z
dc.date.available2021-10-01T08:29:34Z
dc.date.issued1998
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/2750
dc.sourceIIOimport
dc.titleControl and impact of processing ambient during rapid thermal silicidation
dc.typeProceedings paper
dc.contributor.imecauthorMaex, Karen
dc.contributor.imecauthorLauwers, Anne
dc.contributor.imecauthorde Potter de ten Broeck, Muriel
dc.contributor.imecauthorBesser, Paul
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage297
dc.source.endpage306
dc.source.conferenceRapid and Contact Integrated Processing VII
dc.source.conferencedate13/04/1998
dc.source.conferencelocationSan Francisco, CA USA
imec.availabilityPublished - open access
imec.internalnotesMRS Symposium Proceedings; Vol. 525


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