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Qualification of electrical linewidth measurements (ELM) as a metrology tool for 0.18μm and below

dc.contributor.authorMarschner, Thomas
dc.contributor.authorPollentier, Ivan
dc.contributor.authorBaerts, Christina
dc.contributor.authorBoltz, Ingo
dc.contributor.authorRonse, Kurt
dc.contributor.authorVan den hove, Luc
dc.contributor.authorFinders, Jo
dc.contributor.authorGangala, Hareen K
dc.contributor.authorCapodieci, Luigi
dc.date.accessioned2021-10-01T08:29:39Z
dc.date.available2021-10-01T08:29:39Z
dc.date.issued1998
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/2752
dc.sourceIIOimport
dc.titleQualification of electrical linewidth measurements (ELM) as a metrology tool for 0.18μm and below
dc.typeProceedings paper
dc.contributor.imecauthorPollentier, Ivan
dc.contributor.imecauthorBaerts, Christina
dc.contributor.imecauthorRonse, Kurt
dc.contributor.imecauthorVan den hove, Luc
dc.contributor.orcidimecPollentier, Ivan::0000-0002-4266-6500
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage263
dc.source.endpage276
dc.source.conferenceProceedings of the Microlithography Symposium. Interface '98
dc.source.conferencedate15/11/1998
dc.source.conferencelocationSan Diego, CA USA
imec.availabilityPublished - open access


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