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Non-Linearity of the dissolution in advanced EUV photoresist

dc.contributor.authorVesters, Yannick
dc.contributor.authorDe Simone, Danilo
dc.date.accessioned2021-10-23T16:50:43Z
dc.date.available2021-10-23T16:50:43Z
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/27548
dc.sourceIIOimport
dc.titleNon-Linearity of the dissolution in advanced EUV photoresist
dc.typeOral presentation
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.source.peerreviewno
dc.source.conferenceInternational Symposium on Extreme Ultraviolet Lithography - EUVL
dc.source.conferencedate24/10/2016
dc.source.conferencelocationHiroshima Japan
dc.contributor.thesisadvisorDe Gendt, Stefan
dc.identifier.urlhttp://eidec.co.jp/EUVLSymp2016/Oral_PDF_Files/Wed_S3-4.pdf
imec.availabilityPublished - imec
imec.internalnoteswebsite is accessible only for EUVL participant


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