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Electron channeling contrast imaging: potential for future metrology in semiconductor industry

dc.contributor.authorVystavel, Tomas
dc.contributor.authorProkhodtseva, Anna
dc.contributor.authorSchulze, Andreas
dc.contributor.authorCaymax, Matty
dc.date.accessioned2021-10-23T16:57:19Z
dc.date.available2021-10-23T16:57:19Z
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/27561
dc.sourceIIOimport
dc.titleElectron channeling contrast imaging: potential for future metrology in semiconductor industry
dc.typeMeeting abstract
dc.contributor.imecauthorCaymax, Matty
dc.source.peerreviewyes
dc.source.beginpage1951
dc.source.conference230 ECS Meeting: Pacific Rim Meeting - PRiME
dc.source.conferencedate2/10/2016
dc.source.conferencelocationHonolulu, HI USA
dc.identifier.urlhttp://ma.ecsdl.org/content/MA2016-02/30/1951.abstract?sid=370f3d35-2849-459c-a6eb-20f526c6222b
imec.availabilityPublished - imec
imec.internalnotesECS Meeting Abstracts; Vol. MA2016-02


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