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Comparison of EUV and 193i based pattering for advanced node integration

dc.contributor.authorWilson, Chris
dc.date.accessioned2021-10-23T17:13:38Z
dc.date.available2021-10-23T17:13:38Z
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/27593
dc.sourceIIOimport
dc.titleComparison of EUV and 193i based pattering for advanced node integration
dc.typeMeeting abstract
dc.contributor.imecauthorWilson, Chris
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage9776-13
dc.source.conferenceSPIE Advanced Litho - Extreme Ultraviolet (EUV) Lithography VII
dc.source.conferencedate22/02/2016
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttps://spie.org/Documents/ConferencesExhibitions/AL16-Abstracts%20lr.pdf
imec.availabilityPublished - open access


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