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Some critical issues in pattern collapse prevention and repair

dc.contributor.authorXu, XiuMei
dc.contributor.authorVrancken, Nandi
dc.contributor.authorVereecke, Guy
dc.contributor.authorSuhard, Samuel
dc.contributor.authorPourtois, Geoffrey
dc.contributor.authorHolsteyns, Frank
dc.date.accessioned2021-10-23T17:26:50Z
dc.date.available2021-10-23T17:26:50Z
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/27619
dc.sourceIIOimport
dc.titleSome critical issues in pattern collapse prevention and repair
dc.typeProceedings paper
dc.contributor.imecauthorXu, XiuMei
dc.contributor.imecauthorVrancken, Nandi
dc.contributor.imecauthorVereecke, Guy
dc.contributor.imecauthorSuhard, Samuel
dc.contributor.imecauthorPourtois, Geoffrey
dc.contributor.imecauthorHolsteyns, Frank
dc.contributor.orcidimecXu, XiuMei::0000-0002-3356-8693
dc.contributor.orcidimecVereecke, Guy::0000-0001-9058-9338
dc.contributor.orcidimecPourtois, Geoffrey::0000-0003-2597-8534
dc.source.peerreviewyes
dc.source.beginpage147
dc.source.endpage151
dc.source.conferenceUltra Clean Processing of Semiconductor Surfaces XIII - UCPSS
dc.source.conferencedate11/09/2016
dc.source.conferencelocationKnokke-Heist Belgium
dc.identifier.urlhttp://www.scientific.net/SSP.255.147
imec.availabilityPublished - imec


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