dc.contributor.author | Yu, Hao | |
dc.contributor.author | Schaekers, Marc | |
dc.contributor.author | Demuynck, Steven | |
dc.contributor.author | Barla, Kathy | |
dc.contributor.author | Mocuta, Anda | |
dc.contributor.author | Horiguchi, Naoto | |
dc.contributor.author | Collaert, Nadine | |
dc.contributor.author | Thean, Aaron | |
dc.contributor.author | De Meyer, Kristin | |
dc.date.accessioned | 2021-10-23T17:36:51Z | |
dc.date.available | 2021-10-23T17:36:51Z | |
dc.date.issued | 2016 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/27638 | |
dc.source | IIOimport | |
dc.title | MIS or MS? Source/drain contact scheme evaluation for 7nm Si CMOS technology and beyond | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Yu, Hao | |
dc.contributor.imecauthor | Schaekers, Marc | |
dc.contributor.imecauthor | Demuynck, Steven | |
dc.contributor.imecauthor | Barla, Kathy | |
dc.contributor.imecauthor | Horiguchi, Naoto | |
dc.contributor.imecauthor | Collaert, Nadine | |
dc.contributor.imecauthor | Thean, Aaron | |
dc.contributor.imecauthor | De Meyer, Kristin | |
dc.contributor.orcidimec | Yu, Hao::0000-0002-1976-0259 | |
dc.contributor.orcidimec | Schaekers, Marc::0000-0002-1496-7816 | |
dc.contributor.orcidimec | Horiguchi, Naoto::0000-0001-5490-0416 | |
dc.contributor.orcidimec | Collaert, Nadine::0000-0002-8062-3165 | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | no | |
dc.source.beginpage | 19 | |
dc.source.endpage | 24 | |
dc.source.conference | 16th International Workshop on Junction Technology - IWJT | |
dc.source.conferencedate | 9/05/2016 | |
dc.source.conferencelocation | Shanghai China | |
dc.identifier.url | http://ieeexplore.ieee.org/xpl/articleDetails.jsp?arnumber=7486665 | |
imec.availability | Published - open access | |