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Wafer cleaning: a quantifiable process step

dc.contributor.authorMertens, Paul
dc.contributor.authorLoewenstein, Lee
dc.contributor.authorVos, Rita
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorBearda, Twan
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-10-01T08:30:15Z
dc.date.available2021-10-01T08:30:15Z
dc.date.issued1998
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/2763
dc.sourceIIOimport
dc.titleWafer cleaning: a quantifiable process step
dc.typeProceedings paper
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorVos, Rita
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage592
dc.source.endpage606
dc.source.conferenceSemiconductor Silicon 1998. Proceedings of the 8th International Symposium on Silicon Materials Science and Technology
dc.source.conferencedate4/05/1998
dc.source.conferencelocationSan Diego, CA USA
imec.availabilityPublished - open access
imec.internalnotesElectrochemical Proceedings; Vol. 98-1


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