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Mitigation of plasma-induced damage in porous low-k dielectrics by cryogenic precursor condensation

dc.contributor.authorZhang, Liping
dc.contributor.authorde Marneffe, Jean-Francois
dc.contributor.authorLeroy, Florian
dc.contributor.authorLefaucheux, Philippe
dc.contributor.authorTillocher, Thomas
dc.contributor.authorDussart, Remi
dc.contributor.authorMaekawa, Kaoru
dc.contributor.authoryatsuda, koichi
dc.contributor.authorDussarrat, Christian
dc.contributor.authorGoodyear, Andy
dc.contributor.authorCooke, Mike
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorBaklanov, Mikhaïl
dc.date.accessioned2021-10-23T17:49:19Z
dc.date.available2021-10-23T17:49:19Z
dc.date.issued2016
dc.identifier.issn0022-3727
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/27660
dc.sourceIIOimport
dc.titleMitigation of plasma-induced damage in porous low-k dielectrics by cryogenic precursor condensation
dc.typeJournal article
dc.contributor.imecauthorZhang, Liping
dc.contributor.imecauthorde Marneffe, Jean-Francois
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.source.peerreviewyes
dc.source.beginpage17
dc.source.journalJournal of Physics D: Applied Physics
dc.source.issue17
dc.source.volume49
dc.identifier.urlhttp://iopscience.iop.org/article/10.1088/0022-3727/49/17/175203/meta
imec.availabilityPublished - imec


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