Ultra low-k etching by neutral beams produced from CF4/Ar and SF6/Ar ICP plasmas

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Authors
Zotovich, Alexey; El Otell, Ziad; Sutton, Yvonne; Braithwaite, N. St. J.; de Marneffe, Jean-Francois; Baklanov, Mikhail
Conference
Plasma Etch and Strip in Microtechnology - PESM
Title
Ultra low-k etching by neutral beams produced from CF4/Ar and SF6/Ar ICP plasmas
Publication type
Meeting abstract
Embargo date
9999-12-31
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