Publication:

Ultra low-k etching by neutral beams produced from CF4/Ar and SF6/Ar ICP plasmas

Date

2016

Meeting abstract

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Files

34582.pdf 191.74 KB

Author(s)

Zotovich, Alexey

;

;

;

Braithwaite, N. St. J.

;

de Marneffe, Jean-Francois

;

Baklanov, Mikhail

Statistics

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Acq. date: 2026-02-25