Publication:

Sequential infiltration synthesis for line edge roughness mitigation of EUV resist

Date

2017
Journal article
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Author(s)

Baryshnikova, Marina  
;
De Simone, Danilo  
;
Knaepen, Werner  
;
Kachel, Krzysztof
;
Chan, BT  
;
Paolillo, Sara  
;
Maes, Jan  
;
De Roest, David  
;
Rincon Delgadillo, Paulina  
;
Vandenberghe, Geert  

Journal

Journal of Photopolymer Science and Technology

Abstract

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