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Sequential infiltration synthesis for line edge roughness mitigation of EUV resist

dc.contributor.authorBaryshnikova, Marina
dc.contributor.authorDe Simone, Danilo
dc.contributor.authorKnaepen, Werner
dc.contributor.authorKachel, Krzysztof
dc.contributor.authorChan, BT
dc.contributor.authorPaolillo, Sara
dc.contributor.authorMaes, Jan
dc.contributor.authorDe Roest, David
dc.contributor.authorRincon Delgadillo, Paulina
dc.contributor.authorVandenberghe, Geert
dc.date.accessioned2021-10-24T02:55:52Z
dc.date.available2021-10-24T02:55:52Z
dc.date.issued2017
dc.identifier.issn0914-9244
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/27807
dc.sourceIIOimport
dc.titleSequential infiltration synthesis for line edge roughness mitigation of EUV resist
dc.typeJournal article
dc.contributor.imecauthorBaryshnikova, Marina
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.imecauthorKnaepen, Werner
dc.contributor.imecauthorChan, BT
dc.contributor.imecauthorPaolillo, Sara
dc.contributor.imecauthorMaes, Jan
dc.contributor.imecauthorDe Roest, David
dc.contributor.imecauthorRincon Delgadillo, Paulina
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.orcidimecBaryshnikova, Marina::0000-0002-5945-4459
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.contributor.orcidimecChan, BT::0000-0003-2890-0388
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage667
dc.source.endpage670
dc.source.journalJournal of Photopolymer Science and Technology
dc.source.issue6
dc.source.volume30
dc.identifier.urlhttps://www.jstage.jst.go.jp/article/photopolymer/30/6/30_667/_pdf
imec.availabilityPublished - open access
imec.internalnotesPaper from the 34th International Conference of Photopolymer Science and Technology; 2017; Chiba, Japan


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