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dc.contributor.authorCelano, Umberto
dc.contributor.authorFavia, Paola
dc.contributor.authorDrijbooms, Chris
dc.contributor.authorDixon-Luinenburg, Oberon
dc.contributor.authorRichard, Olivier
dc.contributor.authorBender, Hugo
dc.contributor.authorVancoille, Eric
dc.contributor.authorParedis, Kristof
dc.contributor.authorLoo, Roger
dc.contributor.authorSchulze, Andreas
dc.contributor.authorHikavyy, Andriy
dc.contributor.authorWitters, Liesbeth
dc.contributor.authorMitard, Jerome
dc.contributor.authorCollaert, Nadine
dc.contributor.authorHoriguchi, Naoto
dc.contributor.authorVandervorst, Wilfried
dc.date.accessioned2021-10-24T03:20:26Z
dc.date.available2021-10-24T03:20:26Z
dc.date.issued2017
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/27987
dc.sourceIIOimport
dc.titleIndividual device analysis using hybrid TEM-scalpel SSRM metrology
dc.typeProceedings paper
dc.contributor.imecauthorCelano, Umberto
dc.contributor.imecauthorFavia, Paola
dc.contributor.imecauthorDrijbooms, Chris
dc.contributor.imecauthorRichard, Olivier
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorVancoille, Eric
dc.contributor.imecauthorParedis, Kristof
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorHikavyy, Andriy
dc.contributor.imecauthorWitters, Liesbeth
dc.contributor.imecauthorMitard, Jerome
dc.contributor.imecauthorCollaert, Nadine
dc.contributor.imecauthorHoriguchi, Naoto
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.orcidimecCelano, Umberto::0000-0002-2856-3847
dc.contributor.orcidimecFavia, Paola::0000-0002-1019-3497
dc.contributor.orcidimecRichard, Olivier::0000-0002-3994-8021
dc.contributor.orcidimecParedis, Kristof::0000-0002-5163-4164
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.contributor.orcidimecHikavyy, Andriy::0000-0002-8201-075X
dc.contributor.orcidimecMitard, Jerome::0000-0002-7422-079X
dc.contributor.orcidimecCollaert, Nadine::0000-0002-8062-3165
dc.contributor.orcidimecHoriguchi, Naoto::0000-0001-5490-0416
dc.source.peerreviewyes
dc.source.conferenceFrontiers of Characterization and Metrology for Nanoelectronics
dc.source.conferencedate21/03/2017
dc.source.conferencelocationMonterey, CA USA
imec.availabilityPublished - imec


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