Large marginal 2D self-aligned via patterning for sub-5nm technology

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Authors
Choi, Suhyeong; Lee, Jae Uk; Blanco, Victor; Debacker, Peter; Raghavan, Praveen; Kim, Ryan Ryoung han; Shin, Youngsoo
DOI
10.1117/12.2257924
Conference
Design-Process-Technology Co-optimization for Manufacturability XI
Title
Large marginal 2D self-aligned via patterning for sub-5nm technology
Publication type
Proceedings paper
Embargo date
9999-12-31
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